Structural, Optical and Electrical Properties of TiO2:MoS2 Thin Films Prepared by Pulsed-Laser Deposition Technique

Abstract

Titanium dioxide (TiO2) films with different contents of molybdenum dioxide (MoS2) (2, 4, 6, 8 and 10 wt.%) have been deposited on glass at room temperature by pulsed-laser deposition method using an Nd:YAG laser with 1064 nm wavelength, 400mJ energy and 200 shots. The structural, electrical, morphological, and optical characteristics of the deposited films were characterized. The effects of MoS2 content in the deposited films on their characteristics were investigated. The films were polycrystalline and structurally hexagonal and the formation of rutile phase of TiO2 was confirmed. The transmittance of the films was found to increase as the MoS2 content is increased. Also, 0.02 wt.% MoS2 content was the optimum as the largest crystallite size and highest roughness were achieved. The optical band gap of the deposited films was found to decrease with increasing MoS2 content while the refractive index, dielectric constant, and extinction coefficient were measured at 300 nm.