@Article{, title={Methods of Determining The Refractive Index of Thin Solid Films (Review Article)}, author={S.K. Al-Ani}, journal={Iraqi Journal of Applied Physics المجلة العراقية للفيزياء التطبيقية}, volume={4}, number={1}, pages={17-23}, year={2008}, abstract={Thin multilayer graded semiconducting, inorganic, metallic oxides films have wide applications such as optical designs and microelectronics industry. Knowledge of the refractive indices nf(λ) and of such films their dispersion are important. This paper is aimed to present an overview on the different methods that have been devised for the determination of the index of refraction of thin films along with their theoretical basis. Such methods are Abeles, Swanepoel, Kramers-Kronig, Ellipsometer, and others. Some experimental results are also presented. The accuracy of these methods is evaluated.

} }