Found: 33 resources
The Effects of Sputtering Time on Cds Thin Film Solar Cell Deposited by DC Plasma Sputtering Method
Engineering and Technology Journal, 2018, Volume 36, Issue 2 Part (C), Pages 123-127
Effect of Adding Nitrogen to the Gas Mixture on Plasma Characteristics of a Closed-Field Unbalanced DC Magnetron Sputtering System
Iraqi Journal of Applied Physics, 2014, Volume 10, Issue 1, Pages 27-31
Influence of Inter-Electrode Distance, Gas Mixing, Magnetic Field and Cathode Material on Breakdown Voltage of Lab-Made DC Magnetron Sputtering Device
Iraqi Journal of Applied Physics, 2014, Volume 10, Issue 4, Pages 21-25
Characterization of the Copper Oxide Thin Films Deposited by Dc Sputtering Technique
Engineering and Technology Journal, 2014, Volume 32, Issue 4 Part (B) Scientific, Pages 770-776
Discharge Characteristics on the Synthesis of Carbon Nanostructures through Arc-plasma in Water
Engineering and Technology Journal, 2014, Volume 32, Issue 6 Part (B) Scientific, Pages 1120-1127
Photovoltaic Properties of CdS/Si Heterojunction Prepared by DC Plasma Sputtering Technique
Engineering and Technology Journal, 2016, Volume 34, Issue 2 Part (B) Scientific, Pages 311-316
Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques
Iraqi Journal of Applied Physics, 2016, Volume 12, Issue 3, Pages 11-16
Structural Properties of Nickel Oxide Nanostructures Prepared by Closed-Field Unbalanced Dual Magnetron Sputtering Technique
Iraqi Journal of Applied Physics, 2017, Volume 13, Issue 2, Pages 3-10
Preparation and Characterization of Silicon Nitride Nanostructures Prepared by DC Reactive Sputtering Technique with Novel Design of Closed-Field Unbalanced Dual Magnetron Assembly
Iraqi Journal of Applied Physics, 2017, Volume 13, Issue 3, Pages 3-12
The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films
Engineering and Technology Journal, 2018, Volume 36, Issue 2 Part (B) Engineering, Pages 128-130