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Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique

تحضير تراكيب نانوية عالية النقاوة باستخدام تقنية الترذيذ التفاعلي المستمر

Firas J. Kadhim --- Oday A. Hammadi --- Mohammed K. Khalaf --- Bahaa T. Chiad

Iraqi Journal of Applied Physics المجلة العراقية للفيزياء التطبيقية
ISSN: 18132065 23091673 Year: 2016 Volume: 12 Issue: 3 Pages: 27-34
Publisher: iraqi society for alternative and renewable energy sources and techniques الجمعية العراقية لمصادر وتقنيات الطاقة البديلة والمستجدة

Abstract

In this work, metal oxide and nitride nanostructures were prepared by reactive dc magnetron sputtering technique. These nanostructures were synthesized from metal oxide such as NiO and nitride such as Si3N4 for functional materials applications. The prepared nanostructures were diagnosed by x-ray diffraction (XRD) patterns and Fourier-transform infrared (FTIR) spectroscopy. The results showed that the prepared nanostructures are highly pure, which is ascribed to the featured characteristics of magnetron sputtering technique for such purposes.

Keywords

Magnetron sputtering --- Nanostructures --- Reactive sputtering --- Film growth