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Magnetic Field Distribution of Closed-Field Unbalanced Dual Magnetrons Employed in Plasma Sputtering Systems

توزيع المجال المغناطيسي لمجمع الماكنترون المزدوج غير المستقر ذي المجال المغلق والمستخدم في منظومات الترذيذ بالبلازما

Wisam A. Altun --- Mohammed A. Saleh --- Waleed N. Raja --- Oday A. Hammadi

Iraqi Journal of Applied Physics المجلة العراقية للفيزياء التطبيقية
ISSN: 18132065 23091673 Year: 2016 Volume: 12 Issue: 3 Pages: 35-42
Publisher: iraqi society for alternative and renewable energy sources and techniques الجمعية العراقية لمصادر وتقنيات الطاقة البديلة والمستجدة

Abstract

In this work, the spatial distribution of the magnetic field between two magnetrons in a closed-field unbalanced dual magnetron system was studied. The magnetic field was measured as a function of the position along the circumference of the circular surface of one magnetron. As well, the variation of magnetic field intensity along the vertical distance separating the two magnetrons was determined. A strategy was proposed for the measurement of the variation of magnetic field intensity at 4 cm away from the electrode surface along four axes. The spatial distribution of the magnetic field intensity over the magnetron surface at 4cm was determined and analyzed.

Keywords

Magnetic field --- Discharge plasma --- Magnetized plasma --- Magnetron