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Effect of Gas Mixing Ratio on Energy Band Gap of Mixed-Phase Titanium Dioxide Nanostructures Prepared by Reactive Magnetron Sputtering Technique

Esraa A. Al-Oubidy --- Firas J. Al-Maliki

Iraqi Journal of Applied Physics المجلة العراقية للفيزياء التطبيقية
ISSN: 18132065 23091673 Year: 2018 Volume: 14 Issue: 4 Pages: 19-23
Publisher: iraqi society for alternative and renewable energy sources and techniques الجمعية العراقية لمصادر وتقنيات الطاقة البديلة والمستجدة

Abstract

In this work, a homemade dc closed-field unbalanced reactive magnetron sputtering system was used to prepare high-quality and highly pure titanium dioxide nanostructures. The operation parameters of the magnetron sputtering system were optimized to prepare TiO2 nanostructures as thin films on glass substrates. These films were characterized by x-ray diffraction, scanning electron microscopy, atomic force microscopy and Fourier-transform infrared spectroscopy. Both anatase and rutile phases were identified. From the UV-visible spectroscopy, the indirect energy band gap was determined to be 3.30-3.38 eV. The mixing ratio of argon and oxygen (Ar:O2) gases was found very important to control the structural and optical characteristics of the prepared nanostructures.

Keywords

Titanium dioxide --- Thin films --- Nanostructures --- Reactive sputtering