Abstract

In the present work, p-PbSe thin films were prepared by using thermal evaporation technique at room temperature on n-type silicon substrate under vacuum of 10-6 mbar. Thickness of the film is 600 nm. The fabricated devices were subjected to post-deposition annealing at (303, 333, 363 and 393) K and 45 min. The effect of annealing temperature on the electrical properties of PbSe/n-Si junctions was studied. The electrical properties included the capacitance-voltage (C-V) and current-voltage (I-V) measurements. C-V characteristics suggest that the fabricated devices were abrupt type. The built in potential (Vbi) was determined by extrapolation from 1/C2-V curve to the point (V=0. It was equal to (0.7V) at room temperature and was calculated under different annealing temperatures, while from I-V measurements, the ideality factor (β) is calculated.

The article was added to IASJ on 2012-10-23

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