Preparation and Characterization of SiO2 Thin Films as an Antireflective Layer

Abstract

Uniform layers of SiO2 were prepared using thermal evaporation technique under high vacuum (10-5 mbar). Many characterizations were investigated using these films as antireflective layers. The morphological, crystal structural and optical properties of the layers were investigated by using SEM, XRD, and UV-Vis instruments.