Table of content

Iraqi Journal of Applied Physics

المجلة العراقية للفيزياء التطبيقية

ISSN: 18132065 23091673
Publisher: iraqi society for alternative and renewable energy sources and techniques
Faculty:
Language: English

This journal is Open Access

About

The Iraqi Journal of Applied Physics (IJAP) is a peer reviewed journal of high quality devoted to the publication of original research papers from applied physics and their broad range of applications. IJAP publishes quality original research papers, comprehensive review articles, survey articles, book reviews, dissertation abstracts in physics and its applications in the broadest sense. It is intended that the journal may act as an interdisciplinary forum for Physics and its applications. Innovative applications and material that brings together diverse areas of Physics are particularly welcome. Review articles in selected areas are published from time to time. It aims to disseminate knowledge; provide a learned reference in the field; and establish channels of communication between academic and research experts, policy makers and executives in industry, commerce and investment institutions. IJAP is a quarterly specialized periodical dedicated to publishing original papers, letters and reviews in: Applied & Nonlinear Optics, Applied Mechanics & Thermodynamics, Digital & Optical Communications, Electronic Materials & Devices, Laser Physics & Applications, Plasma Physics & Applications, Quantum Physics & Spectroscopy, Semiconductors & Optoelectronics, Solid State Physics & Applications, Alternative and Renewable Energy, Computers Networks and Applications.

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Contact info

P. O. Box 55259,
Baghdad 12001,
Iraq
Website: www.iraqiphysicsjournal.com
Email: admin@iraqiphysicsjournal.com
Email: editor_ijap@yahoo.co.uk

Table of content: 2016 volume:12 issue:3

Article
Iraqi Journal of Applied Physics
المجلة العراقية للفيزياء التطبيقية

Authors: Editorial Board
Pages: 1-1
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Abstract

The Iraqi Journal of Applied Physics (IJAP) is a peer reviewed journal of high quality devoted to the publication of original research papers from applied physics and their broad range of applications. IJAP publishes quality original research papers, comprehensive review articles, survey articles, book reviews, dissertation abstracts in physics and its applications in the broadest sense. It is intended that the journal may act as an interdisciplinary forum for Physics and its applications. Innovative applications and material that brings together diverse areas of Physics are particularly welcome. Review articles in selected areas are published from time to time. It aims to disseminate knowledge; provide a learned reference in the field; and establish channels of communication between academic and research experts, policy makers and executives in industry, commerce and investment institutions. IJAP is a quarterly specialized periodical dedicated to publishing original papers, letters and reviews in: Applied & Nonlinear Optics, Applied Mechanics & Thermodynamics, Digital & Optical Communications, Electronic Materials & Devices, Laser Physics & Applications, Plasma Physics & Applications, Quantum Physics & Spectroscopy, Semiconductors & Optoelectronics, Solid State Physics & Applications, Alternative and Renewable Energy, and Computers and Networks.


Article
Instructions for Authors
تعليمات للمؤلفين

Authors: Editorial Board
Pages: 2-2
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Abstract

The Iraqi Journal of Applied Physics (IJAP) is a peer reviewed journal of high quality devoted to the publication of original research papers from applied physics and their broad range of applications. IJAP publishes quality original research papers, comprehensive review articles, survey articles, book reviews, dissertation abstracts in physics and its applications in the broadest sense. It is intended that the journal may act as an interdisciplinary forum for Physics and its applications. Innovative applications and material that brings together diverse areas of Physics are particularly welcome. Review articles in selected areas are published from time to time. It aims to disseminate knowledge; provide a learned reference in the field; and establish channels of communication between academic and research experts, policy makers and executives in industry, commerce and investment institutions. IJAP is a quarterly specialized periodical dedicated to publishing original papers, letters and reviews in: Applied & Nonlinear Optics, Applied Mechanics & Thermodynamics, Digital & Optical Communications, Electronic Materials & Devices, Laser Physics & Applications, Plasma Physics & Applications, Quantum Physics & Spectroscopy, Semiconductors & Optoelectronics, Solid State Physics & Applications, Alternative and Renewable Energy, and Computers and Networks.


Article
Key Mechanisms of Low-Pressure Glow Discharge in Magnetized Plasmas
الاليات الاساسية للتفريغ التوهجي ذي الضغط الواطيء في البلازما الممغنطة

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Abstract

In this article, the key mechanisms of glow discharge in low-pressure gas mixtures were presented and discussed. The particle motions – mainly collisions – in discharge plasma those considered in most applications of plasma were presented. The regions of glow discharge were identified and their main characteristics were highlighted. These mechanisms were supported by experimental results obtained from a homemade dc plasma sputtering system. The experimental parameters, such as inter-electrode distance, using magnetrons and adding nitrogen to the gas mixture, and their effects on the Paschen’s curve of glow discharge were introduced.


Article
Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques
خصائص تيار-جهد لتفريغ البلازما المستمر المستخدم في تقنيات الترذيذ

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Abstract

In this work, the current-voltage characteristics of dc plasma discharges were studied. The current-voltage characteristics of argon gas discharge at different inter-electrode distances and working pressure of 0.7mbar without magnetrons were introduced. Then the variation of discharge current with inter-electrode distance at certain discharge voltages without using magnetron was determined. The current-voltage characteristics of discharge plasma at inter-electrode distance of 4cm without magnetron, with only one magnetron and with dual magnetrons were also determined. The variation of discharge current with inter-electrode distance at certain discharge voltage (400V) for the cases without magnetron, using one magnetron and dual magnetrons were studied. Finally, the discharge current-voltage characteristics for different argon/nitrogen mixtures at total gas pressure of 0.7mbar and inter-electrode distance of 4cm were presented.


Article
Langmuir Probe Diagnostics of Low-Pressure Glow Discharge Plasma Using Argon-Nitrogen Mixtures
التشخيص باستخدام مجس لانجمور لبلازما التفريغ ذي الضغط الواطئ باستخدام خلائط غازي الاركون والنتروجين

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Abstract

In this work, experimental results on Langmuir probe diagnostics of low-pressure glow discharge plasma using argon-nitrogen mixtures are presented. The effect of variation in working pressure on the current-voltage characteristics of Langmuir probe diagnostics in unmagnetized glow-discharge plasma was introduced. The current-voltage characteristics of Langmuir probe diagnostics in glow-discharge plasma were studied at working pressure of 0.7mbar and three different cases (no magnetron, using one magnetron at the cathode, and using dual magnetrons). Similarly, the current-voltage characteristics of Langmuir probe in glow-discharge plasma at three different positions of the Langmuir probe inside plasma volume were presented. The variation of electron temperature and density in plasma with working gas pressure at the center point between the electrodes when dual magnetrons were used was determined. As well, the effect of mixing nitrogen with argon on the Langmuir probe characteristics at total working pressure of 0.7mbar and inter-electrode distance of 4cm was studied.


Article
Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique
تحضير تراكيب نانوية عالية النقاوة باستخدام تقنية الترذيذ التفاعلي المستمر

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Abstract

In this work, metal oxide and nitride nanostructures were prepared by reactive dc magnetron sputtering technique. These nanostructures were synthesized from metal oxide such as NiO and nitride such as Si3N4 for functional materials applications. The prepared nanostructures were diagnosed by x-ray diffraction (XRD) patterns and Fourier-transform infrared (FTIR) spectroscopy. The results showed that the prepared nanostructures are highly pure, which is ascribed to the featured characteristics of magnetron sputtering technique for such purposes.


Article
Magnetic Field Distribution of Closed-Field Unbalanced Dual Magnetrons Employed in Plasma Sputtering Systems
توزيع المجال المغناطيسي لمجمع الماكنترون المزدوج غير المستقر ذي المجال المغلق والمستخدم في منظومات الترذيذ بالبلازما

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Abstract

In this work, the spatial distribution of the magnetic field between two magnetrons in a closed-field unbalanced dual magnetron system was studied. The magnetic field was measured as a function of the position along the circumference of the circular surface of one magnetron. As well, the variation of magnetic field intensity along the vertical distance separating the two magnetrons was determined. A strategy was proposed for the measurement of the variation of magnetic field intensity at 4 cm away from the electrode surface along four axes. The spatial distribution of the magnetic field intensity over the magnetron surface at 4cm was determined and analyzed.


Article
IJAP Copyright Release Form
استمارة نقل حقوق النشر والتوزيع للمجلة العراقية للفيزياء التطبيقية

Authors: Editorial Board
Pages: 43-43
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Abstract

The authors will keep the following rights: 1. Possession of the article such as patent rights. 2. Free of charge use of the article or part of it in any future work by the authors such as books and lecture notes after informing IJAP editorial board. 3. Republishing the article for any personal purposes of the authors after taking journal permission.


Article
Contents of Issue
محتويات العدد

Authors: Editorial Board
Pages: 44-44
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Abstract

Instructions to Authors 2 Key Mechanisms of Low-Pressure Glow Discharge in Magnetized Plasmas 3-10 O.A. Hammadi, M.K. Khalaf, F.J. Kadhim, B.T. Chiad Current-Voltage Characteristics of DC Plasma Discharges Employed in Sputtering Techniques 10-16 M.K. Khalaf, O.A. Hammadi, F.J. Kadhim Langmuir Probe Diagnostics of Low-Pressure Glow Discharge Plasma Using Argon-Nitrogen Mixtures 17-26 B.T. Chiad, O.A. Hammadi, F.J. Kadhim, M.K. Khalaf Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique 27-34 F.J. Kadhim, O.A. Hammadi, M.K. Khalaf, B.T. Chiad Magnetic Field Distribution of Closed-Field Unbalanced Dual Magnetrons Employed in Plasma Sputtering Systems 35-42 O.A. Hammadi, W.N. Raja, M.A. Saleh, W.A. Altun IJAP Copyright Release Form 43 Contents 44

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